HIS 13 High Intensity VUV Source0 pages

Omicron NanoTechnology GmbH
www.omicron.de
• Photon flux > 1016 photons/s · sr
• Small beam divergence (< ± 1°)
• Excellent HeÉÉ/HeÉ ratio
• Piezo ignition for easy operation
• Viewport for discharge control
• Low maintenance & safe operation
Ph t fl h t /
HIS 13
High Intensity VUV Source
Toroidal focusing
mirror for small spot
size at long working
distance and ARUPS
applications
Continuously rotatable
linear polariser
for full exploitation of
symmetry selection
rules in photoemission
HIS 13 VUV source
The HIS 13 vacuum ultraviolet source achieves
very high intensities by integrating a high voltage
anode into the self-centring discharge capillary
(Ref. 1). A clean capillary - a prerequisite for
both stability with high photon fluxes and long
equipment lifetime - is maintained by means of
continuous gas flow through the discharge region
and optimised differential pumping.
Water cooling prevents the lamp from heating
up, reduces maintanance and allows discharge
currents up to 300 mA. Flexibility for different
applications is provided by a choice of capillary
diameters, and by the linear polarizer and toroidal
focusing mirror options.
For high resolution the HIS 13’s line width can
be tuned, here it was <2 meV.
..E = 3.36 meV
FWHM
Kinetic Energy [eV]
Intensity [arb. units]
Gas Phase UPS (NeI)
Xe 5p3/2
90
60
30
0
4.590 4.600 4.610 4.620
Solid state HRUPS on the Ag Fermi edge, T=10 K. Contributions
of ca. .. 3 meV from the HIS 13 and 3.4 meV (FWHM) sample
thermal broadening.
16.78 16.80 16.82 16.84 16.86 16.88
-0.04 -0.02 EF=0 0.02 0.04
4000
3000
2000
1000
0
Intensity [arb. units]
Kinetic Energy [eV]
Ag foil
T = 10 K
High intensity gives better resolution: shown the HIS
13’s line width <2 meV. A monochromator is thus
redundant for most applications.
He..
He....
Cu
He..../He.. = 1:2
3•105
2•105
105
0
5 10 15 20 25 30 35 40 45 50
N[E] [counts/s]
Kinetic Energy [eV]
Ref. 1: G. Schönhense, U. Heinzmann,
J. Phys. E16, 74 (1983)
HIS13 630-V04/Mar.08