ISE 50 pages

MBE PRO 753-V01/Oct10
ISE 5 - Cold Cathode Ion Sputter Source
The ISE 5 is a compact and versatile ion
sputtering source which offers a low
energy capability, making it the ideal
source for cleaning sensitive samples
and single crystals routinely used in
SPM research. It is very simple and easy
to use with long operating times.
The ISE 5 Ion Source operates over a wide energy
range from 250 eV to 5 keV and delivers a maximum beam current of over 80 µA. The simple
construction of the source, with all the components supported from the earth cover, allows the
ISE 5 to be easily dismantled for cleaning and
overhaul to ensure long term operational advantages. The magnet and cover assembly ensure
that no stray magnetic fields are present.
Fig. 1 shows the main components, including
the removable permanent magnet over the ion
source region, high voltage feedthroughs, gas
inlet and the earth cover over the ion flight tube.
The ISE 5 instrument is shown in Fig. 2.
Operating Principle
The ISE 5 utilises proven cold cathode principals for operation.
Argon gas is fed into the gas cell that acts as the cold cathode ion
source and a voltage is applied between the anode and cathode to
initiate and sustain the gas discharge. The longitudinal magnetic
field through the source region causes any electrons generated in
the discharge to have a spiral path (and an extended path length)
in the discharge which enables them to cause large ion and electron generation. A diagram showing the operating principals can be
found in Fig. 3.
The ions are extracted from the gas cell through an aperture in the
cathode plate and into a flight tube. In the flight tube the ions are
travelling with high energy but are only at the final beam energy
once they have left the source. This feature enables the source
to maintain an acceptable target current at low beam energies.
The focus element in the flight tube enables the ion beam to be
focused onto the sample.
For normal operation gas is fed into the source continuously via a
leak valve providing a pressure differential between the gas supply
and the ion source. The magnetic field enables the discharge
to be generated at relatively low pressures in the gas
cell section of the ISE 5.
2
1
3
4
5
1t Permanent magnet
over source region
2t Cathode HV feedthrough
6
3t Connector shield
4t CF 70 mm OD mounting flange
7
(6 x M6 clearance bolt holes)
5t Anode (Beam Energy) HV feedthrough
Fig. 1: Schematic of ISE 5
6t Earthed cover over ion flight tube
7t Focus HV feedthrough
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Fig. 2: ISE 5 cold cathode ion source.