Archer 1000 pages

Archer 100

Advanced Optical Overlay Metrology

PARAMETRIC

THE ARCHER 100™ OVERLAY CONTROL SYSTEM, based on the industry proven Archer™ platform, meets stringent performance and
cost of ownership (CoO) requirements for 45nm design rules and below. Fully redesigned optics, tighter stage tolerances, new imaging
and illumination modes, shorter MAM time, enhanced algorithms and built-in diagnostics combine to deliver the high levels of process
robustness and productivity needed to address increasingly tighter overlay error budgets. Leveraging KLA-Tencor’s patented AIM™
technology and Archer Analyzer™ software, the Archer 100 enables in-chip metrology and in-field analysis for advance dispositioning
and higher-order overlay control. A smart new automatic recipe optimization (ARO) sequence improves ease of use and tool utilization, enabling relatively unskilled operators to quickly create high quality recipes offline.

PRODUCT DESCRIPTION
Satisfies Tighter Overlay Budgets The Archer 100 is a fully
extendible optical overlay metrology system designed to keep pace with
increasingly challenging lithography control needs. Tighter specifications
of the completely redesigned optics system significantly reduce lens
aberrations, enabling >30% improvement in total measurement uncertainty (TMU) and site-by-site matching. The new XYZ stage positioning
system offers tighter stage tolerances, and the imaging system features
a new camera with high signal-to-noise ratio (SNR), further ensuring
measurement reliability and repeatability.
Improves Process Robustness The redesigned wafer alignment system
delivers sharper optical resolution and contrast. A new illumination
..system with extended spectrum and narrow bandwidth capabilities
improves the measurement signal of low contrast and asymmetric layers,
making the Archer 100 suitable for challenging high-volume manufacturing (HVM) applications such as amorphous carbon layer (aCL) measurements in memory production. Improved low-contrast layer measurements
enable higher accuracy and robustness for better stepper matching and
lithography process control.
Enables Higher-Order Overlay Control Using Smaller AIM Targets
AIM technology, with its periodic imaging-based grating targets, enables
in-chip metrology and in-field modeling required for achieving improved
in-die analysis. This powerful capability helps in advance dispositioning
and process control, providing a clearer understanding of unmodeled
errors and better implementation of dense inter-field and intra-field
sample plans. Archer 100 takes the field-proven AIM technology to the
next level, where the denser structure of enhanced, smaller micro-grating
(µAIM™) targets increases information content with reduced residuals
for higher process robustness.
Greatly Simplifies Ease of Use The ARO feature is a new productivityboosting recipe training sequence that allows less experienced operators
to automatically create optimal recipes offline. Without impacting tool
operation, ARO quickly yields recipes with the best possible performance
and higher success rates. This eliminates the need for operator intervention and any chance of human errors, ultimately freeing up valuable
engineering resources in the fab.
Optimizes Recipe Management The integrated Recipe Database
Manager (RDM+) software gives users offline access to a centralized
database to leverage previously proven recipe components. This reduces
setup time, and increases reliability and traceability of measurement
recipes. The improved Waferless, Imageless, and Automation Recipe
Creation (ARC) modes enable full automation of the recipe creation
process across all KLA-Tencor overlay metrology systems. To ensure recipe
quality, RDM+ offers powerful new options such as Recipe Compare and
Recipe Validation for HVM recipe management and control.

Improves Overall Production CoO The Archer 100 increases throughput to over 80 wafers per hour (production sampling) and delivers 20%
faster move-acquire-measure (MAM) time over existing tools. This enables
rapid intra-field measurement and increased sampling rates, key requirements
for improving yield in immersion lithography. Comprehensive tool diagnostics
minimize downtime risk, while the new optics design accelerates tool installation time. Since offline recipe creation also saves tool time, these factors
– along with options such as the triple load port – enhance tool utilization by more than 20% over the previous generation. The Archer 100
platform is designed to allow a smooth upgrade path to support future
technologies, such as double-patterning lithography (DPL) at 32nm.
Provides Enhanced Analysis Capabilities Archer Analyzer is a fully
automated, real-time overlay analysis software option that incorporates
advanced algorithms and data filters to analyze Archer 100 results ontool. This capability helps to determine if a given wafer lot has met
predetermined parameters, and provides users with critical litho cell
corrections. Wafer lot dispositioning results and stepper correction data
helps lithographers to reduce unnecessary rework and quickly address
variations in lithography tool performance, minimizing cycle time and
yield loss. Archer Analyzer uses the same factory automation interface
as all Archer family systems, enabling easy integration into a 300mm
fab network.
Enables ‘On Product’ Monitoring of Focus/Exposure The MPX™
Focus/Exposure Line Monitor provides an innovative methodology to
monitor photo excursions of focus and exposure on production wafers.
As an option on the Archer 100, MPX improves overlay tool CoO as a
single solution that monitors all stepper controls while providing high
throughput with rapid optical measurements. MPX capitalizes on a
unique capability to separate exposure from focus for accurate process
monitoring while providing real-time focus and exposure metrology.
Comprehensive Process Control The Archer 100 is fully integrated
with KLA-Tencor’s leading yield management software products, including Archer Analyzer stepper analysis, RDM+ recipe data management,
and iSupport™ remote assistance and tool maintenance, to provide
comprehensive optical overlay metrology process control. All software
components have been enhanced in several key areas, including measurement and focus algorithms, recipe setup automation, runtime automation, and analysis. The accelerated production ramp of the Archer 100
allows metrology and lithography engineers to more effectively manage
tightening overlay error budgets, which have a direct impact on device
performance, lithography performance and overall yield.